This project is supported by a National Science Foundation Career Award under Grant No. ECS-9701916 and DMI-0078406.

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This research project focuses on scaling-down the size of inductively coupled plasma generators so that ICPs can be used in microelectromechanical systems. The ICP currently under investigation is surface micromachined on a glass wafer using electroplated gold. The rf power is coupled to the plasma using a spiral-shaped coil that is 5 mm in diameter. As the radius of the plasma is reduced, the frequency of the electrical energy used to drive the plasma increases. Large ICPs (250 mm radius) typically operate at 2 MHz and 2000 W. The miniature ICP below is driven at 450 MHz using a power of only 0.35 W. The ultimate goal is to reduce the ICP to a size of approximately 1 mm.

Photograph of a microfabricated ICP in a hybrid package:

A top view of the ICP shown above with a plasma in the chamber:

A side view of the ICP showing the hybrid package bonded to a 10 mm glass vacuum chamber. The plasma is generated in argon gas at 8 torr using 350 mW of power.

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Go To The Old microICP Page Here