Homework #4

ECE 3626 - Integrated Circuit Fabrication

Problem 1

A high performance photoresist process is able to form an image when the MTF> 0.2. Plot W_min vs. S for a 248 nm light source with a NA of 0.5. Compare this result with a low contrast resist process that requires the MTF > 0.7.

Problem 2

Chapter 8, problem 1

Problem 3

Chapter 8, problem 9

Problem 4

Chapter 8, problem 11